photoresist
光刻胶
常用释义
英音[ ˌfəʊtəʊrɪˈzɪst ]
美音[ ˌfoʊtoʊrɪˈzɪst ]
基本释义
- n. [电子] 光刻胶；[印刷] 光致抗蚀剂；[光] 光阻材料
例句
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1·Photoresist coating preparation and baking; Thin film preparation.光刻胶的旋涂与烘烤，薄膜材料制备。
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2·Exposure dose should be changed with the thickness of SU-8 photoresist.根据SU - 8胶的厚度确定曝光剂量的大小。
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3·But this photoresist was then peeled off, leaving only a pure metal on metal bond.但是这种光刻胶会被剥离，仅留下金属结合。
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4·The method on profile - control of micro - optic element in photoresist was presented.介绍了连续微光学元件在光刻胶上的面形控制方法。
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5·Photoresist grating was fabricated by holography, and it was used in the mask of ion etching.采用全息法制备了光刻胶光栅，并用该光栅掩膜离子蚀刻。
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6·This paper researches the influence of resin and wetting agent for the property of photoresist.本论文研究了光阻剂中分别增加环氧树脂和润湿剂对其性能的影响。
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7·A small undesired hole in an oxide opaque region of a mask or reticle or in a photoresist layer.氧化物、掩模或标线的不透明区域，或光刻层中不需要的小孔。
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8·With the protection of photoresist sidewall, the emitter passivation ledge is fabricated by wet etch.利用光刻胶形成保护侧墙，用湿法腐蚀来形成发射极钝化边沿。
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9·Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.通过反应离子刻蚀可以将光刻胶微透镜图形转移至这种高性能的聚合物材料上。
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10·Researches on the two-photon photopolymerization technology of SU8 negative photoresist have been processed.飞秒激光su8负性光刻胶双光子聚合工艺研究。
同义词
n.
[电子]光刻胶；[助剂][印刷]光致抗蚀剂；[光]光阻材料