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photolithography
光刻法
常用释义
英音[ ˌfəʊtəlɪˈθɒɡrəfi ]
美音[ ˌfoʊtoʊlɪˈθɑːɡrəfi ]
基本释义
  • n. 影印石版术;照相平印术
例句
  • 1·Why not use photolithography to make nano structures?
    为什么不使用光蚀刻法制造奈米结构?
  • 2·Spherical aberration can damage image quality in photolithography.
    球面像差能破坏光刻的成像质量。
  • 3·First, consider the advantages and disadvantages of photolithography.
    首先,想想光蚀刻法的优点跟缺点。
  • 4·The patterned anodic aluminum oxide (AAO) template was fabricated by UV-photolithography.
    采用紫外光刻法制得图案化的阳极氧化铝模板。
  • 5·The photo-induced etching effect, or development-free vapor photolithography is a very interesting phenomenon.
    光致诱蚀作用或无显影气相光刻作用是一个非常有趣的现象。
  • 6·The business unit's capabilities including photolithography, micro-etch and small scale thermal dissipation technology.
    该业务部门的技术能力包括照相平版印刷、微蚀刻和小规模散热技术。
  • 7·The prototype of the micro actuator is fabricated by means of micro electroforming and SU-8 photolithography techniques.
    利用SU-8光刻胶制备电铸模和微电铸工艺,制造了二维微执行器原型。
  • 8·The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.
    首先,采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道;
  • 9·Influences of side-wall slope of photolithography pattern on characteristic dimensions after ion implantation are analyzed.
    分析了光刻图形侧墙斜坡对离子注入后图形特征尺寸的影响。
  • 10·A first photolithography process forms first and second diffusion trench openings for the first and second diffusion regions.
    第一光刻工艺为第一和第二扩散区形成了第一和第二扩散沟槽开口。
同根词
词根: photographer
photomechanical adj 照相工艺的
photographically adv 用照相;逼真地
photographer n 摄影师;照相师
photogravure n 凹版照相;凹版印刷
photolithograph n 影印石版画;照相平版印刷品
photomechanical n 照相制版工艺;照相制版法
photomontage n 蒙太奇照片;集锦照相
photogravure vt 用凹版印刷;用凹版印刷复制