ion beam sputtering
离子束溅射
常用释义
英式发音
美式发音
基本释义
- 离子束溅射；离子束溅镀法
例句
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1·The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
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2·The newly designed films of green HeNe laser have been coated by making use of ion beam sputtering deposition, and the measured results have been given out.利用离子溅射镀膜技术镀制了所设计的膜片并且给出了测量结果。
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3·It is of great importance to improve the properties of DLC films deposited with simultaneous ion bombardment du-ring film growth by ion beam sputtering on graphite target.在离子束溅射石墨靶淀积dlc膜的同时用离子束轰击，对于拓宽和改善DLC膜的性质有重要意义。
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4·The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.溅射特性研究结果表明：屏极电压和溅射气压对离子束均匀性和束流密度影响显著；
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5·Its structure and character were reviewed, and the synthetic methods, including CVD, ion beam sputtering, laser ablation, ion plating and ion irradiation et al., were completely introduced.目前主要采用化学气相沉积法、离子束溅射法、激光等离子体沉积和激光烧蚀、离子镀、离子注入法等制备方法。
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6·A series of giant positive magnetoresistance of magnetic multilayer structure were fabricated by ion-beam sputtering in high vacuum with applied magnetic field and treatment.采用离子束溅射方法制备了正巨磁电阻多层膜，在制备过程中采用外加磁场和退火处理。
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7·The X-ray multilayer mirror for longer wavelength fabricated with ion-beam-sputtering deposition instrument OXFORD, is introduced in this paper.叙述用离子束溅射镀膜机OXFORD进行X射线长波段多层膜实验及制备X射线多层膜光学元件方面的工作。
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8·In ion-beam sputtering deposition and ion-beam aid deposition thin film techniques, ion-beam source is one of the key techniques.在离子束溅射和离子辅助沉积光学薄膜技术中，离子源是其中最关键的单元技术之一。
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9·The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
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10·The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。