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chemical vapor deposition
与原子层沉积相比较。
常用释义
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基本释义
  • 化学气相沉积:一种在高温气体中进行气相化学反应,将物质的通常薄固体层沉积在表面上的技术,与原子层沉积相比较。
例句
  • 1·The methods of preparing diamond films by chemical vapor deposition were reviewed.
    评述了金刚石薄膜的化学气相沉积方法。
  • 2·The carbon nanotubes were synthesized by the heat filament chemical vapor deposition.
    研究所用的碳纳米管是用热灯丝化学气相沉积法合成的。
  • 3·High quality diamond thin films were grown by hot-filament chemical vapor deposition.
    采用热丝化学气相沉积生长出优异的金刚石薄膜。
  • 4·The carbon nanotubes were synthesized by the heat filament chemical vapor deposition (CVD).
    实验中所用碳纳米管由化学气相沉积法(CVD)合成。
  • 5·Carbon nanotubes in experiments were synthesized by hot filament chemical vapor deposition.
    所用的碳纳米管是用热灯丝化学气相沉积法合成的。
  • 6·In this paper, substrate materials of diamond films by chemical vapor deposition are discussed.
    讨论了化学气相沉积金刚石薄膜的各种衬底材料。
  • 7·This paper gives an overview of plasma enhanced chemical vapor deposition used in the solar industry.
    本文针对电浆辅助化学气相沉积在太阳能产业上的应用作一概略性的介绍。
  • 8·Experimental results on amorphous silicon growth by CO2 laser chemical vapor deposition are reported.
    本文报道了CO_2激光化学气相沉积非晶硅的实验研究。
  • 9·The conventional preparing method -chemical vapor deposition (CVD) need a long period and expensive cost.
    传统化学气相沉积(CVD)工艺制备周期长,而且成本高。
  • 10·The hydrogen plasma was excited by the technology of helicon-wave plasma chemical vapor deposition (HWP-CVD).
    利用螺旋波等离子体化学气相沉积(HWP - CVD)技术,以氢气为反应气体产生等离子体。